Tungsten Hexafluoride (WF₆) is a colorless to pale yellow, highly volatile, corrosive inorganic gas (molecular weight: 297.83). It exists as a liquid at room temperature and is vaporized for use. Its gas density at 20°C is approximately 13.0 g/L (approximately 10 times that of air). It is highly reactive and rapidly hydrolyzes upon contact with water or moisture to form hydrogen fluoride and tungsten trioxide. As the standard precursor for tungsten deposition in semiconductor CVD processes, tungsten hexafluoride is an indispensable specialty gas in modern chip manufacturing.
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